spin.pe titech.ac.jp
NAKAGAWA Laboratorys Home Page
Last Updated on 28, Mar, 2005. In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method. The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and plasma free condition. Department of Physical Electronics. Faculty of Engineering,. Tokyo Institute of Technology. 2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN.
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The web page spin.pe.titech.ac.jp presently has a traffic classification of zero (the smaller the better). We have analyzed one page inside the web page spin.pe.titech.ac.jp and found two websites interfacing with spin.pe.titech.ac.jp.
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1Links to this site
2SPIN.PE.TITECH.AC.JP TRAFFIC
The web page spin.pe.titech.ac.jp is seeing fluctuating amounts of traffic within the past the year.
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SPIN.PE.TITECH.AC.JP SERVER
I caught that a lone root page on spin.pe.titech.ac.jp took three thousand six hundred and sixty milliseconds to stream. We could not find a SSL certificate, so our crawlers consider this site not secure.
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3.66 sec
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NOT SECURE
IP
131.112.125.45
SERVER SOFTWARE AND ENCODING
We caught that spin.pe.titech.ac.jp is operating the Apache os.HTML TITLE
NAKAGAWA Laboratorys Home PageDESCRIPTION
Last Updated on 28, Mar, 2005. In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method. The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and plasma free condition. Department of Physical Electronics. Faculty of Engineering,. Tokyo Institute of Technology. 2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN.PARSED CONTENT
The web page states the following, "Last Updated on 28, Mar, 2005." I viewed that the web page stated " In our laboratory, we research magnetic recording technique and magnetic thin film technologies using sputtering method." They also said " The Facing Target Sputtering system, which was developed in our laboratory, exerts one of the best film deposition method of the world with high deposition rate and plasma free condition. 2-12-1-S3-42 O-okayama, Meguro, Tokyo 152-8552, JAPAN."ANALYZE SUBSEQUENT WEB PAGES
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